Plasma Science and Technology : Impact Factor & More

eISSN: 2058-6272pISSN: 1009-0630

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Plasma Science and Technology Key Metrics

CiteScore
3.1
SNIP
0.74
Time to Publish
time-to-publish View Chart
6
 Mo

Topics Covered on Plasma Science and Technology

Dielectric barrier discharge
Argon
Electron temperature
Electron density
Gas composition
Laser-induced breakdown spectroscopy
Germination
Simulation
Shock wave
Magnetic field
Atmospheric pressure
Pulsed plasma thruster
Aqueous solution
Plasma density
Corona discharge
Kinetic theory
Semiconductor plasma
Laser-induced fluorescence
Reactive oxygen species
Radio frequency

Plasma Science and Technology Journal Specifications

Overview
Publisher IOP PUBLISHING LTD
Language English
Frequency Monthly
General Details
LanguageEnglish
FrequencyMonthly
Publication Start Year1999
Publisher URLVisit website
Website URLVisit website
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Time to Publish
% of papers by time taken from submission to publication
0 to 3 months
4%
4 to 6 months
42%
7 to 9 months
50%
Above 9 months
4%

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FAQs on Plasma Science and Technology

How long has Plasma Science and Technology been actively publishing? Faqs

Plasma Science and Technology has been in operation since 1999 till date.

What is the publishing frequency of Plasma Science and Technology? Faqs

Plasma Science and Technology published with a Monthly frequency.

How many articles did Plasma Science and Technology publish last year? Faqs

In 2023, Plasma Science and Technology publsihed 233 articles.

What is the eISSN & pISSN for Plasma Science and Technology? Faqs

For Plasma Science and Technology, eISSN is 2058-6272 and pISSN is 1009-0630.

What is Citescore for Plasma Science and Technology? Faqs

Citescore for Plasma Science and Technology is 3.1.

What is SNIP score for Plasma Science and Technology? Faqs

SNIP score for Plasma Science and Technology is 0.74.

Who is the publisher of Plasma Science and Technology? Faqs

IOP PUBLISHING LTD is the publisher of Plasma Science and Technology.