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Plasma Chemistry and Plasma Processing : Impact Factor & More

eISSN: 1572-8986pISSN: 0272-4324

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Plasma Chemistry and Plasma Processing Key Metrics

CiteScore
5.4
H-Index
72
Impact Factor
< 5
SJR
Q2Condensed Matter Physics
SNIP
1.12
Time to Publish
time-to-publish View Chart
5
 Mo

Topics Covered on Plasma Chemistry and Plasma Processing

Plasma jet
Dielectric barrier discharge
Reactive oxygen species
Plasma reactor
Human melanoma
Glow discharge
Plasma treatment
Germination
Atmospheric pressure
Toluene
O2 plasma
Information engineering
Argon
Electric field
Electrostatic discharge
Glow discharge plasma
Seed treatment
Bond strength
Antibacterial efficacy
Electric arc

Plasma Chemistry and Plasma Processing Journal Specifications

Overview
Publisher SPRINGER
Language English
Frequency Bi-monthly
General Details
LanguageEnglish
FrequencyBi-monthly
Publication Start Year1981
Publisher URLVisit website
Website URLVisit website
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Time to Publish
% of papers by time taken from submission to publication
0 to 3 months
8%
4 to 6 months
60%
7 to 9 months
19%
Above 9 months
13%

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Compare journals across 7 parameters SJR Ranking, Topics covered, Indexing Database, Publication Review Time, Publication Type, Article Processing Charges & Recently Published papers

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FAQs on Plasma Chemistry and Plasma Processing

How long has Plasma Chemistry and Plasma Processing been actively publishing? Faqs

Plasma Chemistry and Plasma Processing has been in operation since 1981 till date.

What is the publishing frequency of Plasma Chemistry and Plasma Processing? Faqs

Plasma Chemistry and Plasma Processing published with a Bi-monthly frequency.

How many articles did Plasma Chemistry and Plasma Processing publish last year? Faqs

In 2023, Plasma Chemistry and Plasma Processing publsihed 127 articles.

What is the eISSN & pISSN for Plasma Chemistry and Plasma Processing? Faqs

For Plasma Chemistry and Plasma Processing, eISSN is 1572-8986 and pISSN is 0272-4324.

What is Citescore for Plasma Chemistry and Plasma Processing? Faqs

Citescore for Plasma Chemistry and Plasma Processing is 5.4.

What is the H Index for Plasma Chemistry and Plasma Processing ? Faqs

H Index for Plasma Chemistry and Plasma Processing is 72.

What is SNIP score for Plasma Chemistry and Plasma Processing? Faqs

SNIP score for Plasma Chemistry and Plasma Processing is 1.12.

What is the SJR for Plasma Chemistry and Plasma Processing? Faqs

SJR for Plasma Chemistry and Plasma Processing is Q2.

Who is the publisher of Plasma Chemistry and Plasma Processing? Faqs

SPRINGER is the publisher of Plasma Chemistry and Plasma Processing.

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