Explore All Access
Check if your research matches the topics covered in Plasma Chemistry and Plasma Processing?
- Degree of match
- Common matching concepts
- Additional journal recommendations
Plasma Chemistry and Plasma Processing : Impact Factor & More
eISSN: 1572-8986pISSN: 0272-4324
Share this on:
Check your submission readiness
Find out how your manuscript stacks up against 24 technical compliance and 6 language quality checks.
Plasma Chemistry and Plasma Processing Key Metrics
CiteScore 
5.4
H-Index
72
Impact Factor
< 5
SJR
Q2Condensed Matter Physics
SNIP
1.12
Time to Publish
View Chart Mo
Time to Publish
Sign up now and unlock a detailed chart of Time to publish for this journal
% of papers by time taken from submission to publication
0 to 3 months36%
4 to 6 months50%
7 to 9 months12%
Above 9 months2%
Did you find this useful?
Topics Covered on Plasma Chemistry and Plasma Processing
Plasma jet
Dielectric barrier discharge
Reactive oxygen species
Plasma reactor
Human melanoma
Glow discharge
Plasma treatment
Germination
Atmospheric pressure
Toluene
O2 plasma
Information engineering
Argon
Electric field
Electrostatic discharge
Glow discharge plasma
Seed treatment
Bond strength
Antibacterial efficacy
Electric arc
Plasma Chemistry and Plasma Processing Journal Specifications
Indexed in the following public directories
Web of Science 
Scopus 
Inspec 
SJR
| Overview | |
| Publisher | SPRINGER |
| Language | English |
| Frequency | Bi-monthly |
| General Details | |
| Language | English |
| Frequency | Bi-monthly |
| Publication Start Year | 1981 |
| Publisher URL | Visit website |
| Website URL | Visit website |
View less
Planning to publish in Plasma Chemistry and Plasma Processing ?
Upload your Manuscript to get
- Degree of match
- Common matching concepts
- Additional journal recommendations
Recently Published Papers in Plasma Chemistry and Plasma Processing
Perspectives on Coupling Nonthermal Plasma Generated in Gas–Liquid Water Environments with Microbes
- 14 Nov 2024
- Plasma Chemistry and Plasma Processing
Synthesis of Acetylene and Benzene in Controlled Methane-Plasma System
- 7 Nov 2024
- Plasma Chemistry and Plasma Processing
Influence of Novel Anode Structure on the Heat Flow Characteristics and Jet Stability of Pure Nitrogen Laminar Torch
- 6 Nov 2024
- Plasma Chemistry and Plasma Processing
Different Grain Sizes of $${\mathrm{{MgAl}}_2\mathrm{{O}}_4}$$ Doped Alumina and Its Influence on SPD, CDBD, and APTD
- 27 Oct 2024
- Plasma Chemistry and Plasma Processing
The Inactivation of E. coli and B. subtilis Spores Treated Individually, Sequentially and Simultaneously with Humified Air Dielectric Barrier Discharge Plasma and Ultraviolet
- 24 Oct 2024
- Plasma Chemistry and Plasma Processing
Towards the Understanding of Parameters Allowing to Anticipate the Precipitation Reaction of Metallic Precursors in Humid Air Gliding Arc Plasma Reactor
- 22 Oct 2024
- Plasma Chemistry and Plasma Processing
Perspectives on Coupling Nonthermal Plasma Generated in Gas–Liquid Water Environments with Microbes
- 14 Nov 2024
- Plasma Chemistry and Plasma Processing
Synthesis of Acetylene and Benzene in Controlled Methane-Plasma System
- 7 Nov 2024
- Plasma Chemistry and Plasma Processing
Influence of Novel Anode Structure on the Heat Flow Characteristics and Jet Stability of Pure Nitrogen Laminar Torch
- 6 Nov 2024
- Plasma Chemistry and Plasma Processing
Different Grain Sizes of $${\mathrm{{MgAl}}_2\mathrm{{O}}_4}$$ Doped Alumina and Its Influence on SPD, CDBD, and APTD
- 27 Oct 2024
- Plasma Chemistry and Plasma Processing
The Inactivation of E. coli and B. subtilis Spores Treated Individually, Sequentially and Simultaneously with Humified Air Dielectric Barrier Discharge Plasma and Ultraviolet
- 24 Oct 2024
- Plasma Chemistry and Plasma Processing
Towards the Understanding of Parameters Allowing to Anticipate the Precipitation Reaction of Metallic Precursors in Humid Air Gliding Arc Plasma Reactor
- 22 Oct 2024
- Plasma Chemistry and Plasma Processing
Compare Similar Journals with Plasma Chemistry and Plasma Processing
Select Journals to Compare with Plasma Chemistry and Plasma Processing
Total journals - 9
You can select up to 3 Journals at a time
Plasma Science and Technology
Publisher: IOP PUBLISHING LTD
IEEE Transactions on Plasma Science
Publisher: IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
Plasma Sources Science and Technology
Publisher: IOP PUBLISHING LTD
Journal of Hazardous Materials
Publisher: ELSEVIER
Physics of Plasmas
Publisher: AIP PUBLISHING
Chemical Engineering Journal
Publisher: ELSEVIER SCIENCE SA
Plasma Processes and Polymers
Publisher: WILEY-V C H VERLAG GMBH
Journal of Physics Conference Series
Publisher: Institute of Physics Publishing
Applied Surface Science
Publisher: ELSEVIER
0 Journals Selected to compare with
Plasma Chemistry and Plasma Processing
Compare journals across 7 parameters SJR Ranking, Topics covered, Indexing Database, Publication Review Time, Publication Type, Article Processing Charges & Recently Published papers
SJR Ranking, Topics covered, Indexing Database, Publication Review Time, Publication Type, Article Processing Charges & Recently Published papers
Get detailed Journal comparison report on your email by signing up
FAQs on Plasma Chemistry and Plasma Processing
How long has Plasma Chemistry and Plasma Processing been actively publishing? 
Plasma Chemistry and Plasma Processing has been in operation since 1981 till date.
What is the publishing frequency of Plasma Chemistry and Plasma Processing?
Plasma Chemistry and Plasma Processing published with a Bi-monthly frequency.
How many articles did Plasma Chemistry and Plasma Processing publish last year?
In 2023, Plasma Chemistry and Plasma Processing publsihed 127 articles.
What is the eISSN & pISSN for Plasma Chemistry and Plasma Processing?
For Plasma Chemistry and Plasma Processing, eISSN is 1572-8986 and pISSN is 0272-4324.
What is Citescore for Plasma Chemistry and Plasma Processing?
Citescore for Plasma Chemistry and Plasma Processing is 5.4.
What is the H Index for Plasma Chemistry and Plasma Processing ?
H Index for Plasma Chemistry and Plasma Processing is 72.
What is SNIP score for Plasma Chemistry and Plasma Processing?
SNIP score for Plasma Chemistry and Plasma Processing is 1.12.
What is the SJR for Plasma Chemistry and Plasma Processing?
SJR for Plasma Chemistry and Plasma Processing is Q2.
Who is the publisher of Plasma Chemistry and Plasma Processing?
SPRINGER is the publisher of Plasma Chemistry and Plasma Processing.
