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Japanese Journal of Applied Physics : Impact Factor & More

eISSN: 1347-4065pISSN: 0021-4922

Aims and Scope of Japanese Journal of Applied Physics

The Japanese Journal of Applied Physics is a peer-reviewed scientific journal that was established in 1962 and is published by the Japan Society of Applied Physics. In 2008, Part 2 was separated as an independent journal and renamed Applied Physics Express. Part 1 continues to be published as the Japanese Journal of Applied Physics. Less

Key Metrics

CiteScore
3
Impact Factor
< 5
SJR
Q2Engineering (all)
SNIP
0.61
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Topics Covered on Japanese Journal of Applied Physics

Japanese Journal of Applied Physics Journal Specifications

Indexed in the following public directories

  • Web of Science Web of Science
  • Inspec Inspec
  • SJR SJR
Overview
Publisher IOP PUBLISHING LTD
Language English
Frequency Monthly
General Details
LanguageEnglish
FrequencyMonthly
Publication Start Year1962
Publisher URLVisit website
Website URLVisit website
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Recently Published Papers in Japanese Journal of Applied Physics

Photovoltaic Science and Engineering 2025
  • 1 Jul 2026
  • Japanese Journal of Applied Physics
Thermochromic VO2 films deposited by reactive DC sputtering using a V metal target
  • 1 Jul 2026
  • Japanese Journal of Applied Physics
Enhanced tunnel spin polarization of Fe/MgO contacts on Si by pre-metallization annealing of MgO
  • 29 Jun 2026
  • Japanese Journal of Applied Physics
Effects of annealing conditions on the interfacial adhesion energy of ALD Ru/ZnO films for advanced interconnects
  • 29 Jun 2026
  • Japanese Journal of Applied Physics
In-situ surface analysis during atomic layer etching of TiN by chlorine radical irradiation at low temperature and thermal desorption
  • 29 Jun 2026
  • Japanese Journal of Applied Physics
Low-temperature flattening of rubrene films fabricated by electric-field-assisted deposition from surfactant-stabilized aqueous suspensions
  • 26 Jun 2026
  • Japanese Journal of Applied Physics
Photovoltaic Science and Engineering 2025
  • 1 Jul 2026
  • Japanese Journal of Applied Physics
Thermochromic VO2 films deposited by reactive DC sputtering using a V metal target
  • 1 Jul 2026
  • Japanese Journal of Applied Physics
Enhanced tunnel spin polarization of Fe/MgO contacts on Si by pre-metallization annealing of MgO
  • 29 Jun 2026
  • Japanese Journal of Applied Physics
Effects of annealing conditions on the interfacial adhesion energy of ALD Ru/ZnO films for advanced interconnects
  • 29 Jun 2026
  • Japanese Journal of Applied Physics
In-situ surface analysis during atomic layer etching of TiN by chlorine radical irradiation at low temperature and thermal desorption
  • 29 Jun 2026
  • Japanese Journal of Applied Physics
Low-temperature flattening of rubrene films fabricated by electric-field-assisted deposition from surfactant-stabilized aqueous suspensions
  • 26 Jun 2026
  • Japanese Journal of Applied Physics

FAQs on Japanese Journal of Applied Physics