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Overview | |
Publisher | IOS PRESS |
Language | English |
Frequency | Semi-annual |
General Details | |
Language | English |
Frequency | Semi-annual |
Publication Start Year | 2008 |
Publisher URL | Visit website |
Website URL | Visit website |
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International Journal of RF Technologies: Research and Applications has been in operation since 2008 till date.
International Journal of RF Technologies: Research and Applications published with a Semi-annual frequency.
In 2023, International Journal of RF Technologies: Research and Applications publsihed 12 articles.
For International Journal of RF Technologies: Research and Applications, eISSN is 1754-5749 and pISSN is 1754-5730.
Citescore for International Journal of RF Technologies: Research and Applications is 1.3.
SNIP score for International Journal of RF Technologies: Research and Applications is 0.94.
IOS PRESS is the publisher of International Journal of RF Technologies: Research and Applications.