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Plasma Sources Science and Technology is an international journal dedicated solely to non-fusion aspects of plasma science. The Journal was founded in 1992 by Professor Noah Hershkowitz of the University of Wisconsin–Madison who also served as Editor-in-Chief until 2007. Mark J. Kushner of the Michigan Institute for Plasma Science and Engineering, University of Michigan took over the leadership of the journal until 2013 when Professor Bill Graham, Queen's University Belfast, became Editor-in-Chief. Professor Graham was followed by Professor Uwe Czarnetzki, Ruhr University Bochum, who became Editor-in-Chief in 2017. Professor Czarnetzki is actively involved in the peer-review of every paper. Less
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Overview | |
Publisher | IOP PUBLISHING LTD |
Language | English |
Frequency | Bi-monthly |
General Details | |
Language | English |
Frequency | Bi-monthly |
Publication Start Year | 1992 |
Publisher URL | Visit website |
Website URL | Visit website |
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4.9K articles received 140K citationssee all
Plasma Sources Science and Technology has been in operation since 1992 till date.
Plasma Sources Science and Technology published with a Bi-monthly frequency.
In 2023, Plasma Sources Science and Technology publsihed 243 articles.
For Plasma Sources Science and Technology, eISSN is 1361-6595 and pISSN is 0963-0252.
Citescore for Plasma Sources Science and Technology is 6.3.
SNIP score for Plasma Sources Science and Technology is 1.53.
SJR for Plasma Sources Science and Technology is Q1.
IOP PUBLISHING LTD is the publisher of Plasma Sources Science and Technology.