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International Journal of RF Technologies: Research and Applications : Impact Factor & More

eISSN: 1754-5749pISSN: 1754-5730

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International Journal of RF Technologies: Research and Applications Key Metrics

CiteScore
1.3
SNIP
0.94

International Journal of RF Technologies: Research and Applications Journal Specifications

Overview
Publisher IOS PRESS
Language English
Frequency Semi-annual
General Details
LanguageEnglish
FrequencySemi-annual
Publication Start Year2008
Publisher URLVisit website
Website URLVisit website
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FAQs on International Journal of RF Technologies: Research and Applications

How long has International Journal of RF Technologies: Research and Applications been actively publishing? expand

International Journal of RF Technologies: Research and Applications has been in operation since 2008 till date.

What is the publishing frequency of International Journal of RF Technologies: Research and Applications? expand

International Journal of RF Technologies: Research and Applications published with a Semi-annual frequency.

How many articles did International Journal of RF Technologies: Research and Applications publish last year? expand

In 2023, International Journal of RF Technologies: Research and Applications publsihed 10 articles.

What is the eISSN & pISSN for International Journal of RF Technologies: Research and Applications? expand

For International Journal of RF Technologies: Research and Applications, eISSN is 1754-5749 and pISSN is 1754-5730.

What is Citescore for International Journal of RF Technologies: Research and Applications? expand

Citescore for International Journal of RF Technologies: Research and Applications is 1.3.

What is SNIP score for International Journal of RF Technologies: Research and Applications? expand

SNIP score for International Journal of RF Technologies: Research and Applications is 0.94.

Who is the publisher of International Journal of RF Technologies: Research and Applications? expand

IOS PRESS is the publisher of International Journal of RF Technologies: Research and Applications.

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