REVISTA GESTION DE LAS PERSONAS Y TECNOLOGIA

eISSN: 0718-5693 pISSN: 0718-5693

Indexed in the following public directories

  • Web of Science
  • DOAJ

Journal Specifications

Overview
Publisher UNIV SANTIAGO CHILE, FAC TECNOLOGICA
Language Spanish
Frequency Tri-annual
Publication Time 4
Editorial Review Process Double anonymous peer review
General Details
Language Spanish
Frequency Tri-annual
Publication Start Year 2008
Website URL Visit website
Publication Details
Other charges Visit website
Plagiarism Visit website
Publication Time 4
Editorial Review Detail
Editorial Team Visit website
Review Process Double anonymous peer review
Review Url Visit website
Information for authors
Author instructions Visit website
License type CC BY-NC-ND
OA statement Visit website

Planning to publish in REVISTA GESTION DE LAS PERSONAS Y TECNOLOGIA ?

Upload your Manuscript to get

  • Degree of match
  • Common matching concepts
  • Additional journal recommendations

Looking for the right journals to submit your mansucript?

Upload your manuscript and get a submission readiness score and other journal recommendations.

Check my Paper

Scite analysis

Powered by scite_

61 articles received 12 citations see all

  • 0 Supporting
  • 3 Mentioning
  • 0 Contrasting

Editorial notices

  • 0 Retractions
  • 0 Withdrawals
  • 0 Corrections
  • 0 Errata
  • 0 Expression of Concern

FAQs

How long has REVISTA GESTION DE LAS PERSONAS Y TECNOLOGIA been actively publishing?

REVISTA GESTION DE LAS PERSONAS Y TECNOLOGIA has been in operation since 2008 till date.

What is the publishing frequency of REVISTA GESTION DE LAS PERSONAS Y TECNOLOGIA ?

REVISTA GESTION DE LAS PERSONAS Y TECNOLOGIA published with a Tri-annual frequency.

What is the eISSN & pISSN for REVISTA GESTION DE LAS PERSONAS Y TECNOLOGIA ?

For REVISTA GESTION DE LAS PERSONAS Y TECNOLOGIA,eISSN is 0718-5693 and pISSN is0718-5693.

Who is the publisher of REVISTA GESTION DE LAS PERSONAS Y TECNOLOGIA ?

UNIV SANTIAGO CHILE, FAC TECNOLOGICA is the publisher of REVISTA GESTION DE LAS PERSONAS Y TECNOLOGIA.