Plasma Sources Science and Technology is an international journal dedicated solely to non-fusion aspects of plasma science. The Journal was founded in 1992 by Professor Noah Hershkowitz of the University of Wisconsin–Madison who also served as Editor-in-Chief until 2007. Mark J. Kushner of the Michigan Institute for Plasma Science and Engineering, University of Michigan took over the leadership of the journal until 2013 when Professor Bill Graham, Queen's University Belfast, became Editor-in-Chief. Professor Graham was followed by Professor Uwe Czarnetzki, Ruhr University Bochum, who became Editor-in-Chief in 2017. Professor Czarnetzki is actively involved in the peer-review of every paper.
CiteScore measures average citations received per document published in the serial.
Eigenfactor Score measures the number of times articles from the journal published in the past five years have been cited. This does not include self citations.
Impact factor of a journal is calculated by dividing the number of current year citations to the source items published in that journal during the previous two years.
scite Index is the ratio of citations supporting research which is published in the journal to sum of citations either supporting or contrasting the research published in the journal for the same time period. Minimum 100 supporting citations required.
SCImago Journal Rank measures weighted citations received by the serial. Citation weighting depends on subject field and prestige (SJR) of the citing serial.
Source Normalized Impact per Paper measures actual citations received relative to citations expected for the serial’s subject field.
Based on turnaround time from submission to publication for papers (articles & reviews) published in 2022 and for journals with a sample of more than 10 papers.
Overview | |
Publisher | IOP PUBLISHING LTD |
Language | English |
Frequency | Bi-monthly |
General Details | |
Language | English |
Frequency | Bi-monthly |
Publication Start Year | 1992 |
Publisher URL | Visit website |
Website URL | Visit website |
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Based on turnaround time from submission to publication for papers (articles & reviews) published in 2022 and for journals with a sample of more than 10 papers.
Plasma Sources Science and Technology has been in operation since 1992 till date.
Plasma Sources Science and Technology published with a Bi-monthly frequency.
In 2023, Plasma Sources Science and Technology published 243 articles.
For Plasma Sources Science and Technology,eISSN is 1361-6595 and pISSN is0963-0252.
Citescore for Plasma Sources Science and Technology is 6.3.
SNIP score for Plasma Sources Science and Technology is 1.53.
SJR for Plasma Sources Science and Technology is Q1.
IOP PUBLISHING LTD is the publisher of Plasma Sources Science and Technology.