Key Metrics
5.4
CiteScore
CiteScore
CiteScore measures average citations received per document published in the serial.
< 5
Impact Factor
Impact Factor
Impact factor of a journal is calculated by dividing the number of current year citations to the source items published in that journal during the previous two years.
72
H index
H-Index
Journal's h-index reflects the collective citation impact of the authors publishing in the journal. The h-index is defined as the maximum value of h such that the given journal has published at least h papers that have each been cited at least h times.
0.93
5-Year SI
5-year SI
- N/A 2-year SI
- 0.93 Lifetime SI
Scite Index
Scite Index
scite Index is the ratio of citations supporting research which is published in the journal to sum of citations either supporting or contrasting the research published in the journal for the same time period. Minimum 100 supporting citations required.
Q2
Condensed Matter Physics
SJR
- Q2 Condensed Matter Physics
- Q2 Chemistry (miscellaneous)
- Q2 Surfaces, Coatings and Films
- Q2 Chemical Engineering (miscellaneous)
SJR
SJR
SCImago Journal Rank measures weighted citations received by the serial. Citation weighting depends on subject field and prestige (SJR) of the citing serial.
1.12
SNIP
SNIP
Source Normalized Impact per Paper measures actual citations received relative to citations expected for the serial’s subject field.
Indexed in the following public directories
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Web of Science -
Scopus -
Inspec -
SJR
Topics Covered on Plasma Chemistry and Plasma Processing
- Plasma jet
- Dielectric barrier discharge
- Reactive oxygen species
- Plasma reactor
- Human melanoma
- Glow discharge
- Plasma treatment
- Germination
- Atmospheric pressure
- Toluene
- O2 plasma
- Information engineering
- Argon
- Electric field
- Electrostatic discharge
- Glow discharge plasma
- Seed treatment
- Bond strength
- Antibacterial efficacy
- Electric arc
Journal Specifications
| Overview | |
| Publisher | SPRINGER |
| Language | English |
| Frequency | Bi-monthly |
| General Details | |
| Language | English |
| Frequency | Bi-monthly |
| Publication Start Year | 1981 |
| Publisher URL | Visit website |
| Website URL | Visit website |
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Check my PaperRecently Published Papers
-
Full paper
Biostimulant Effects of Plasma-Activated Water on Germination and Early Seedling Development of Tree Tomato (Solanum betaceum Cav.)
- 21 Apr 26
- Plasma Chemistry and Plasma Processing
-
Full paper
A Pulse-Modulated Microwave Atmospheric Pressure Plasma Jet and its Applications in Polymer Modifications
- 20 Apr 26
- Plasma Chemistry and Plasma Processing
-
Full paper
Understanding an “In Principle Rather Old Gas Discharge”: Plasma Diagnostics on Dielectric Barrier Discharges
- 20 Apr 26
- Plasma Chemistry and Plasma Processing
-
Full paper
Soil Nitrogen Enrichment with Atmospheric Pressure Cold Plasma for Higher Wheat Plants Growth
- 14 Apr 26
- Plasma Chemistry and Plasma Processing
-
Full paper
Plasma Cracking of Liquid Hydrocarbons at Room Temperature for Efficient Production of Hydrogen
- 27 Mar 26
- Plasma Chemistry and Plasma Processing
-
Full paper
Study on Plasma Drying of Expandable Graphite and Influencing Factors
- 27 Mar 26
- Plasma Chemistry and Plasma Processing
Scite analysis
Powered by scite_
2.3k articles received 33k citations see all
- 1,345 Supporting
- 31,232 Mentioning
- 101 Contrasting
Editorial notices
- 0 Retractions
- 0 Withdrawals
- 8 Corrections
- 3 Errata
- 0 Expression of Concern
FAQs
How long has Plasma Chemistry and Plasma Processing been actively publishing?
Plasma Chemistry and Plasma Processing has been in operation since 1981 till date.
What is the publishing frequency of Plasma Chemistry and Plasma Processing ?
Plasma Chemistry and Plasma Processing published with a Bi-monthly frequency.
How many articles did Plasma Chemistry and Plasma Processing publish last years ?
In 2025, Plasma Chemistry and Plasma Processing published 77 articles.
What is the eISSN & pISSN for Plasma Chemistry and Plasma Processing ?
For Plasma Chemistry and Plasma Processing,eISSN is 1572-8986 and pISSN is0272-4324.
What is Citescore for Plasma Chemistry and Plasma Processing ?
Citescore for Plasma Chemistry and Plasma Processing is 5.4.
What is H index for Plasma Chemistry and Plasma Processing ?
H index for Plasma Chemistry and Plasma Processing is 72.
What is SNIP score for Plasma Chemistry and Plasma Processing ?
SNIP score for Plasma Chemistry and Plasma Processing is 1.12.
What is the SJR for Plasma Chemistry and Plasma Processing ?
SJR for Plasma Chemistry and Plasma Processing is Q2.
Who is the publisher of Plasma Chemistry and Plasma Processing ?
SPRINGER is the publisher of Plasma Chemistry and Plasma Processing.