International Journal of RF Technologies: Research and Applications

eISSN: 1754-5749 pISSN: 1754-5730

Key Metrics

1.3
CiteScore
0.94
SNIP

Journal Specifications

Overview
Publisher IOS PRESS
Language English
Frequency Semi-annual
General Details
Language English
Frequency Semi-annual
Publication Start Year 2008
Publisher URL Visit website
Website URL Visit website

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Recently Published Papers

Scite analysis

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158 articles received 522 citations see all

  • 5 Supporting
  • 506 Mentioning
  • 0 Contrasting

Editorial notices

  • 0 Retractions
  • 0 Withdrawals
  • 0 Corrections
  • 0 Errata
  • 0 Expression of Concern

FAQs

How long has International Journal of RF Technologies: Research and Applications been actively publishing?

International Journal of RF Technologies: Research and Applications has been in operation since 2008 till date.

What is the publishing frequency of International Journal of RF Technologies: Research and Applications ?

International Journal of RF Technologies: Research and Applications published with a Semi-annual frequency.

How many articles did International Journal of RF Technologies: Research and Applications publish last years ?

In 2023, International Journal of RF Technologies: Research and Applications published 10 articles.

What is the eISSN & pISSN for International Journal of RF Technologies: Research and Applications ?

For International Journal of RF Technologies: Research and Applications,eISSN is 1754-5749 and pISSN is1754-5730.

What is Citescore for International Journal of RF Technologies: Research and Applications ?

Citescore for International Journal of RF Technologies: Research and Applications is 1.3.

What is SNIP score for International Journal of RF Technologies: Research and Applications ?

SNIP score for International Journal of RF Technologies: Research and Applications is 0.94.

Who is the publisher of International Journal of RF Technologies: Research and Applications ?

IOS PRESS is the publisher of International Journal of RF Technologies: Research and Applications.